USE OF PULSED-UV PROCESSES TO DESTROY NDMA
The main objective of this study is to evaluate the effectiveness of pulsed-UV and pulsed-UV/H202 processes for N-nitrosodimethylamine (NDMA) removal. Pulsed-UV with a small amount of H2O2 could be used to control the reaction by-products and to inhibit the reformation of NDMA by using hydroxyl radicals generated during the photolysis of H202. In contrast, pulsed-UV with a larger amount of H202 could inhibit NDMA decay by direct photolysis.
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| Cote DDD: | 67/24182 |